Japan Tamura Manufacturing Co., Ltd. successfully developed gallium oxide substrate LED

Japan's Tamura Manufacturing Co., Ltd. and Gwangbo Co., Ltd. have announced that they have developed GaN-based LED devices using gallium oxide substrates. The LED devices developed have a current of 10 times or more per unit area compared to LED devices using sapphire substrates. The component and gallium oxide (Ga2O3) substrate are expected to be available at the end of 2011.

This LED component will be used for applications requiring high brightness such as headlamps and projectors. Further, since the gallium oxide substrate can be formed by simple solution growth, it is a technology that can achieve cost reduction, and can also be used for lighting and the like.

The gallium oxide substrate has high conductivity, and the GaN-based LED element using the substrate can be provided with electrodes on both the front and back sides. Japan's Tamura Manufacturing Co., Ltd. and Gwangbo Co., Ltd. have developed a technology to significantly reduce the buffer layer resistance between a gallium oxide substrate and a GaN-based epitaxial layer, and to establish a low-resistance n-type ohmic contact electrode on a gallium oxide substrate. The LED element that can flow a large current is realized.

Although there is a view that the gallium oxide substrate is easily broken, it is said that this problem is solved by adjusting the plane direction of the gallium oxide substrate.

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